Electroluminescent photoresists extending lithographic scaling to OLEDs.

Electroluminescent photoresists enable sub-110 nm patterning and high-efficiency OLEDs, advancing monolithic integration in organic electronics.

• Why it matters: Current fabrication methods hinder the scaling and integration of organic light-emitting diodes with silicon-based circuits, limiting device miniaturization and performance.
• What they did: Synthesizing atom transfer radical polymerization–based multi-arm star polymers with core-shell architecture allowed ultraviolet and electron-beam lithography to directly pattern electroluminescent layers, achieving features as small as 110 nm and efficiencies over 13%.
• The result: This approach facilitates ultrahigh-resolution OLED fabrication and paves the way for extending Moore's law to organic optoelectronics, enabling more compact, efficient, and integrated photonic devices.